Stanislav K.

Arc Modelling and Simulation @ Eaton

About

Consulting Services in Physics Thin film deposition magnetron sputtering, pulsed discharges, HIPIMS Specialties: Development of special custom simulation software Process optimization

Country

Czechia

City

Prague

Industry

Electrical & Electronic Manufacturing

Skill

Magnetron design, PVD, Thin Films, Sputtering, Simulation, Plasma Physics, Design of Experiments, C++, Process Development, Programming, .NET, Delphi, Fortran, C#, Simulations, Solar Cells, Physics, AFM, Coatings, Materials Science

Experience

Arc Modelling and Simulation

Eaton

2017-10 - Present · 9 yrs

Praha

Manager, Arc Modeling and Simulation

Eaton

2018-11 - Present · 7 yrs 11 mos

Praha

Consultant, programmer

Staccato Consulting

2000-1 - Present · 26 yrs 9 mos

Praha

Optimization of film thickness uniformity and target utilization in thin film equipment used for wafer processing, optical data storage and display technology. Developed computer code for magnetron, including: - Single-particle 3D model for magnetron sputtering in C#. - Developed a time-resolved VB.NET version of the Direct Simulation Monte Carlo program for pulsed sputtering and HIPIMS. - A .NET program suite “WaferFit” used to regulate a patented “FlexiCath” magnetron from OC Oerlikon.

HVM Plasma

HVM Plasma Ltd.

2010-1 - 2017-9 · 7 yrs 9 mos

Praha

Development of coating technologies and processes including reactive pulsed techniques, HIPIMS. Dielectric thin film technology for solar cell and sensors.

R@D Physicist

Oerlikon

1999-4 - 2004-10 · 5 yrs 7 mos

Balzers

Development of own simulation software and introducining commercial one (SIMBAD/SIMSPUD,PVD-Pro, CFD-ACE+ ,OOPIC). Optimization of film thickness uniformity and target utilization in thin film equipment used for wafer processing, optical data storage and display technology. Project management in development of physical Vapor Deposition (PVD) processes, including HIPIMS. Own software development: magnetic field simulation, film uniformity, single-particle 3D model for magnetron sputtering (C++). Developed for example ionized-PVD system based on magnetic plasma confinement, magnetrons for 300mm wafer technology and large magnetrons for flat panel displays.

Researcher

FZU - Institute of Physics of the Czech Academy of Sciences

1990 - 1999-3 · 9 yrs

Praha, Czech Republic

Development of PVD systems (magnetron sputtering, ion plating) based on plasma diagnostics (energy-resolved mass spectrometry), probe diagnostics. Deposited nanocomposite coatings, such as TiN - Ni.