Peilin Ong

- Successfully collaborated with KLA to conduct on-site defect metrology tool evaluation for KLA iCOS, including the establishment of scope of work and success criteria. Led a team of 3 in completing the evaluation and implemented demo tool to production in a short span of 2 months. - Coordinated with internal equipment design team and supplier to integrate optical linescan defect inspection on process tool. - Led implementation of FMEA within the company that includes identifying an appropriate methodology for FMEA execution, designing rating tables tailored to the organization, and collaborating closely with various stakeholders including design and process teams.

- Engineering manager for optical/x-ray team, responsible for metrology technology development on techniques including scatterometry, ellipsometry, x-rays (XRR/XRF/XRD), profile (AFM). In charge of pairing tool capabilities with current yield issues to ensure adequate inline detection. - Led team in enabling multiple new detections for Optane utilizing both dimensional and compositional metrology as well as novel solutions such as machine learning, providing non-destructive inline visibility to the line for early detection. - Developed metrology roadmap collaborating with cross-functional teams, identifying key challenges and gap closures required. - Developed engineers through coaching, providing consistent performance feedback, and establishing clear development plans for individuals.

- Took lead role in technology transfer of 3DXpoint to Intel, collaborating with multiple stakeholders to successfully complete metrology matching for > 400 layers in a short span of 3 months. Ensured alignment and resolution for mismatch for several layers, contributing to a successful startup.

- Collaborated with Onto Innovation to develop real-time process indicators using machine learning techniques (spectraprobe). Successfully developed Pillar Tilt and 1-sided bow and implemented as a real-time indicator for process tuning. Joint paper between Micron and Onto Innovation was presented in the AVS 65th International Symposium. - Successfully establishing dual vendor site strategy by leading the first-ever Micron Singapore on-site head-to-head metrology evaluation for KLA and Onto Innovation, establishing effective decision matrix by working closely with TD fab and suppliers to complete the evaluation in 3 months. -Wealth of transfer experience that includes leading a team in first-ever replacement gate technology and floating gate technology transfer. Also played a major role in pioneering fab start up in 2010. - Innovation on inline detection sensitivity improvement for NAND pillar CD, with new methodology of selecting measurements dies for improved Dry Etch chamber drift detection sensitivity. - Initiated multiple improvement projects catering to process needs for more reliable inline monitoring and balance capacity among workstations for better cycle time, 1 of which allowed the cancellation of a 2nd tool purchase resulting in cost savings of >US$1million.