Gang Shen

5+ years hands-on experience with low-pressure chemical vapor deposition (CVD) process, performing maintenance and upgrading hardware Thorough knowledge of mass transport, thermodynamics, and chemical kinetics in CVD; and understanding of semiconductors and metal oxides properties and deposition process Skillful user of instruments for material characterization (TEM, SEM, EDS, APT, PL, Raman) and nanofabrication (dual beam FIB), including data analysis Experienced with semiconductor device processing in a clean room environment Chemical Vapor Depostion - Designing, maintaining and upgrading customized CVD system - Skillful user of commercial CVD system by CVD Equiment Corporation - Modeling of CVD process by mass transport, thermodynamics, and chemical kinetics. - CVD growth of semiconductor nanostructure and thin film Transmission Electron Microscopy - Skillful user of FEI F20 TEM - High resolution bright field imaging of thin film and nanostructures - Defect analysis with HRTEM and diffraction pattern - STEM imaging by HAADF detector - EDS line profile and imaging in STEM mode Focused Ion Beam - Skillful user of FEI dual beam system - TEM sample preparation using ion beam milling and lift-out process - Nanowire LEAP sample preparation by Pt welding of nanowire on sample holder - Thin film LEAP sample preparation by lift-out and annular milling Local Electrode Atom Probe - Skillful user of IMAGO LEAP system - Atom probe tomography of nanowires and thin film sample with data analysis Scanning Electron Microscopy - Skillful user of JEOL 7000F and Philips XL30 SEM - High resolution SEM imaging with EDS analysis Photoluminescence - Confocal photoluminescence analysis of semiconductor materials - Study of optical properites by PL sprctrum Raman spectroscopy - Confocal measurement of Raman spectrum - Defect and stress analysis by Raman spectrum