Fangfang Huo

As a Doctoral Researcher at Technische Universität Berlin, I have been conducting research on epitaxial growth structure and optical electrical property of tin oxide films using hollow cathode gas flow sputtering technology. I have collaborated with a team to analyze data and present findings at industry conferences, and developed expertise in thin film deposition techniques and characterization methods. I have also achieved a breakthrough in optimizing film properties for enhanced performance in electronic devices. Prior to this, I earned my Master's degree in Material Science and Engineering from Zhengzhou University, where I gained a solid foundation in the principles and applications of materials science. I am passionate about advancing the field of material science and engineering, and I am always eager to learn new skills and technologies.