Ali FAKIH

At Murata, I work as a Production Process Engineer specializing in thin film deposition techniques such as PVD, CVD, and epitaxy. My role involves qualifying and optimizing advanced manufacturing equipment, improving process stability and uniformity, and ensuring high-quality production for semiconductor devices. I also contribute to metrology, data analysis, and process documentation, and actively support cross-functional teams by developing tools, presentations, and training materials to enhance knowledge sharing and operational efficiency.

Postdoctoral researcher at CRISMAT, ENSICAEN (Caen, France), specializing in transport measurements of thermoelectric and semiconductor materials. Contributed to the development of hybrid perovskites for energy applications and modeled multi-carrier conduction in RuO₂. Designed a cost-effective glove box for air-sensitive samples and led projects on metal oxides. Delivered technical reports and presentations with a strong emphasis on scientific communication.

Ph.D. researcher at Sorbonne Université (Paris, France), focused on thin film niobium dioxide. Manipulated carrier density in crystalline and amorphous NbO₂ using electrostatic (space charge) doping. Demonstrated that negative differential resistance in NbO₂ is current-controlled. Developed a novel Raman spectroscopy-based thermometer to measure local temperatures beyond conventional system limits.